会议名称(中文)：  2014年SPIEX-Ray/EUV光学组件进展进展研讨会
会议名称(英文)：  Advances in X-Ray/EUV Optics and Components IX
所属学科：  光学,仪器仪表与装置
开始日期：  2014-08-17
结束日期：  2014-08-21
所在国家：  美国
所在城市：  美国
具体地点：  San Diego, California
主办单位：  国际光学和光子学学会

[ 重要日期 ]
摘要截稿日期：  2014-02-03

[ 会务组联系方式 ]
 
联系电话：  +1 360 685 5600
 
E-MAIL：  saral@spie.org
 
会议网站：  http://spie.org/OPO/conferencedetails/x-ray-euv-optics
会议背景介绍： 
Expanding use of x-ray and EUV radiation in many scientific and technical applications requires the continued development of new and improved sources and optics to deliver brighter, better-conditioned beams to the end-user. This conference focuses on the advances, as well as the emerging needs, in x-ray and EUV sources, optics, and applications including next-generation synchrotron sources, EUV photolithography, laboratory sources, and x-ray astronomy.

In radiation to sources and source/optics integration, the topics covered include design, development, fabrication, installation, evaluation, and applications of optical elements such as mirrors, monochromators, multilayers, zone-plates, and lenses. It is also an aim of this conference to provide an opportunity for the developers and users to share both the progress and challenges in each of these and related areas.
征文范围及要求： 
Presentations covering emerging needs, progress reports, and topical reviews related to the following and related topics are solicited:
x-ray sources (novel, synchrotron, XFEL, laboratory-based, etc...)
emerging needs in x-ray, XFEL, and EUV optics
novel optical substrates, materials, processes, and applications
crystal optics design, fabrication, and applications
x-ray and EUV mirror fabrication: surface figuring and finishing techniques, capabilities, and limitations
management of optical components under high heat/radiation load and in hostile environments
thermal and mechanical stability of optical systems
active/passive/adaptive shape control of optical elements
optical and x-ray metrology of optical substrates
coherence preservation and optical surface quality
coating- and multilayer-based optics and performance
focusing optics including refractive, reflective, and diffrative optics
filters, windows, x-ray beam position monitors
x-ray optics for extreme spatial and / or energy resolution
x-ray optics software and simulation.