会议名称(英文)： Advances in Metrology for X-Ray and EUV Optics V
所属学科： 光学
开始日期： 2014-08-17
结束日期： 2014-08-21
所在国家： 美国
所在城市： 美国
具体地点： San Diego, California
主办单位： 国际光学和光子学学会
摘要截稿日期： 2014-02-03
联系电话： +1 360 685 5600
E-MAIL： saral@spie.org
会议网站： http://spie.org/OPO/conferencedetails/x-ray-metrology
会议背景介绍：
This conference will address the broad issues in the growing and very demanding field of surface metrology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X-Ray applications such as astronomical imaging, solar physics, and lithography. Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.
征文范围及要求：
Papers are solicited on the following and related topics:
surface figure and finish measurement
slope profilometry
sub-aperture stitching
wavefront sensing and characterization
at-wavelength metrology of x-ray and EUV optics
metrology of x-ray astronomical optics
metrology of coherence-preserving mirrors
metrology data analysis software and error reduction
metrology of adaptive optics
mirror characterization using scattering techniques
mirror specification using the power spectral density function
characterization of optics for astronomical imaging
novel instrumentation and techniques
tolerancing with the help of modeling
calibration tools and methods.
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