会议名称(中文)：2014年SPIE仪器仪表计量以及纳米制造标准研讨会
会议名称(英文)：Instrumentation, Metrology, and Standards for Nanomanufacturing VIII
所属学科：纳米科学与技术
开始日期：2014-08-17
结束日期：2014-08-21
所在国家：美国
所在城市：美国
具体地点：San Diego, California
主办单位：国际光学和光子学学会
协办单位：
承办单位：
议题：
[ 组织结构 ]
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组织委员会主席：
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姓名 职务 简介 演讲题目
[ 重要日期 ]
摘要截稿日期： 2014-02-03
[ 会务组联系方式 ]
联系人：
联系电话：+1 360 685 5600
传真：
E-MAIL：saral@spie.org
通讯地址：
邮政编码：
会议注册费：
会议网站：http://spie.org/OPN/conferencedetails/instrumentation-metrology-standards-nanomanufacturing-optics-semiconductors
会议背景介绍：
Nanomanufacturing is the essential bridge between nanoscience and real world nanotech products. In this rapidly developing field, a broad spectrum of products that will affect virtually every industrial sector is emerging. In order to achieve the broad impacts envisioned, nanotech products must be manufactured in market-appropriate quantities in a reliable, repeatable, and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust nanomanufacturing is the development of appropriate instrumentation, metrology, and standards.
As novel applications emerge, the demand for highly sensitive and efficient metrology tools with capability of rapid and thorough coverage of large functional areas is emerging. This includes the fast and area-covering measurement of properties such as nanoroughness, flatness and figure, thin film structure, and nano-particle contamination. Furthermore, for the development of nanostructured surfaces with specific functionalities (e.g. self-cleaning, tribological effects), a tight link between measurement and modeling tool becomes essential.
The multidisciplinary character of the conference provides a forum to present and discuss the newest developments of metrology techniques as well as industrial needs for new measurement equipment and reference materials. The measurement principles include e.g. scanning-probe microscopy, optical microscopies and profilometry, light scattering methods, SEM-based metrology, ellipsometry, reflectometry, interferometry and nanoparticle characterization instrumentation.
If a nano-enabled product cannot be measured, it cannot be manufactured; additionally if that product cannot be made safely it also should not be manufactured. The Instrumentation, Metrology, and Standards for Nanomanufacturing will become the leading forum for the exchange of foundational information and discussion of the essential instrumentation, metrology and standards required for nanomanufacturing. This conference welcomes original technical papers on these and other relevant topics. Criteria for abstract peer review and rating will include contribution to scientific understanding, relevance and interest to the nanomanufacturing community, and lack of advertisements. Submitted papers must concentrate on the underlying technologies and methods, not on product marketing.
征文范围及要求：
Consistent with the SPIE conference charter and goals, please, submit the technical papers in the broad technology areas listed below:
nanomanufacturing methodologies
metrology and inspection methodologies
high resolution optics, including full-field, near-field and scanned microscopy, scatterometry, and interferometric techniques
high throughput and roll-to-roll methodologies
particle beam (electron, ion), including scanned microscopy and elemental analysis
atomic force microscopy
regional alliances/clusters for nanomanufacturing
characterization metrologies and novel measurement techniques
process optimization, monitoring, and quality assurance and reliability
integration, interoperability, and information management
calibration for metrology tools, linewidth, pitch standards, and reference materials
estimation of total measurement error, including precision and accuracy
reference measurement systems, traceability and metrology comparisons
environmental, health and safety monitoring and metrology
3D critical dimension metrology
physics of the metrology processes, system-sample interaction
modeling of systems and samples: characterization and model parameters
predictive modeling: combining experimental and simulated data
data analysis methods, library-based image analysis, and algorithms
application of statistical data analysis methods in manufacturing
process integration of image recording and transfer, etch, and deposition
metrology and related functional testing through self-test in systems-on-a-chip
characterization of nanostructured functional (e.g. superhydrophobic or hydrophilic) surfaces
nanotopography and nanoroughness, nanoparticle measurement and analysis
characterization of nano-objects used in commercial products. |
