会议名称(中文)： 第八届等离子体纳米技术与科学国际会议
会议名称(英文)： 8th International Conference on Plasma-Nano Technology & Science
所属学科： 等离子体物理,高分子化学与物理,纳米科学与技术
开始日期： 2015-03-26
结束日期： 2015-03-31
所在国家： 日本
所在城市： 日本
具体地点： Nagoya, Japan
主办单位： Nagoya University
[ 重要日期 ]
摘要截稿日期： 2014-10-17
会议背景介绍：
ISPlasma is specialized international symposium where about 1,000 world-leading scientists and engineers can get together in the Tokai region (central Japan) to discuss latest researches in the fields of advanced plasma science, its application for processing and manufacturing of nitrides and nanomaterials, as well as new systems for technology transfers. This symposium will address issues such as global warming, resources and energy problems to which advanced plasma science and its application technologies can greatly contribute. We aim that holding of this symposium stimulates progress of plasma science and its application, and contributes to the improvement of social life.
征文范围及要求：
Sessions
PLASMA SCIENCE
A1 : Plasma Engineering
A2 : Plasma Deposition
A3 : Plasma Medicine
A4 : Plasma Applications
A5 : Atomospheric Pressure Plasma
A6 : Solution Plasma
FUNCTIONAL SEMICONDUCTORS
B1 : Nitride Process
B2 : Application of Nitride Semiconductors
B3 : SiC・Diamond・Ohter Related Materials
NANOMATERIALS and NANO/MICRO FABRICATION
C1 : Nanostructured and Nanocomposite Materials
C2 : Catalyst / Battery
C3 : Solar Cell
C4 : Environmental and Energy Materials
C5 : Microfluidics, Nanofludices, and microTAS
SURFACE FUNCTIONALIZATION
D1 : Hard Coating
D2 : Chemical Process
D3 : Functional Thin Films
D4 : Biosurface |
