会议名称(中文)： 37th International Symposium on Dry Process
会议名称(英文)： 37th International Symposium on Dry Process
所属学科： 基础物理学,等离子体物理
开始日期： 2015-11-05
结束日期： 2015-11-06
所在国家： 日本
所在城市： 日本
具体地点： Awaji Island, Japan
主办单位： The Japan Society of Applied Physics
会议背景介绍：
The 37th International Symposium on Dry Process (DPS2015) will be held at Awaji Yumebutai International Conference Center, Awaji Island, in Japan, on November 5 & 6, 2015.
The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.
征文范围及要求：
Topics
Etching Technology
Manufacturing Technology(AEC, APC, EES, FDC)
Surface Reaction and Damage
Plasma Diagnostics and Monitoring System
Modeling and Simulation
Plasma Generation(Equipment/Source)
CVD/PVD/ALD
Plasma Processes for 3D Device, FPD, Photovoltaic Devices
Plasma Processes for New Material Devices (MRAM, Power, Organic)
Plasma Processes for Biological and Medical Application, MEMS
Atmospheric Pressure Plasma and Liquid Plasma
New Dry Process Concepts |
